Dr. Moshe E. Preil
Sr. Marketing Manager at KLA
SPIE Involvement:
Conference Chair | Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editor | Author
Publications (32)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Wafer-level optics, Oxides, Signal to noise ratio, Reticles, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers

SPIE Journal Paper | 29 September 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Lens design, Optical lithography, Immersion lithography, Photomasks, Neck, Lithography, Critical dimension metrology, Visualization, Optical proximity correction

Proceedings Article | 28 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Electron beam lithography, Metrology, Optical lithography, Data modeling, Etching, 3D modeling, Photomasks, Semiconducting wafers, Tolerancing

Proceedings Article | 22 March 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Code division multiplexing, Neck, Lithography, Optical lithography, Modulation, Visualization, Ions, Lens design, Optical resolution, Photomasks, Extreme ultraviolet, Directed self assembly, Immersion lithography, Neodymium, Semiconducting wafers

Showing 5 of 32 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 4 November 2019

Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
20 September 2020 | Monterey, California, United States
Photomask Technology
20 September 2020 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Photomask Technology
16 September 2019 | Monterey, California, United States
Showing 5 of 11 Conference Committees
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top