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Motokatsu Imai
Manager at Nikon corporation
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Publications (2)
Proceedings Article | 18 March 2015 Paper
An improved virtual aberration model to simulate mask 3D and resist effects
Reiji Kanaya, Koichi Fujii, Motokatsu Imai, Tomoyuki Matsuyama, Takao Tsuzuki, Qun Ying Lin
Proceedings Volume 9426, 94261O (2015) https://doi.org/10.1117/12.2085606
KEYWORDS: 3D modeling, Photomasks, Wavefronts, Projection systems, Diffraction, Computer simulations, Finite-difference time-domain method, Optical lithography, Lithography, Lithographic illumination
Proceedings Article | 23 March 2011 Paper
A simple method of source optimization for advanced NAND FLASH process
Yi-Shiang Chang, Satoshi Ogasawara, Koichi Fujii, Shigeru Hirukawa, Motokatsu Imai, Wan-Lin Kuo, Chia-Chi Lin
Proceedings Volume 7973, 79731Z (2011) https://doi.org/10.1117/12.878887
KEYWORDS: Seaborgium, Light sources, Optical lithography, Imaging systems, Excel, Photomasks, Source mask optimization, Lithography, Lithographic illumination, Logic
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