Dr. Motoki Kadowaki
at Toshiba Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Defect detection, Particles, Inspection, Image acquisition, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Sensors, Particles, Inspection, Image acquisition, Electron microscopes, Scanning electron microscopy, Optical inspection, Image quality, Extreme ultraviolet

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Particles, Inspection, Electron microscopes, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Electron beams, Optical spheres, Silica, Silicon, Inspection, Scanning electron microscopy, Data acquisition, Monte Carlo methods, Wet etching

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Electron beams, Silica, Sensors, Dielectrics, Silicon, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Electron beams, Silica, Scattering, Sensors, Silicon, Laser scattering, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Electron transport

Showing 5 of 6 publications
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