Dr. Motoki Kadowaki
at Toshiba Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Defect detection, Particles, Inspection, Image acquisition, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Performance modeling, Systems modeling

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Signal to noise ratio, Sensors, Particles, Inspection, Image acquisition, Electron microscopes, Scanning electron microscopy, Optical inspection, Image quality, Extreme ultraviolet

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Particles, Inspection, Electron microscopes, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Prototyping, Defect inspection

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Oxides, Electron beams, Optical spheres, Silica, Silicon, Inspection, Scanning electron microscopy, Data acquisition, Monte Carlo methods, Wet etching

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Electron beams, Silica, Sensors, Dielectrics, Silicon, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Optical simulations, Defect inspection

Showing 5 of 6 publications
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