Moutaz Fakhry
Senior Member of Technical Staff at AMD
SPIE Involvement:
Author
Area of Expertise:
Lithography , Source mask optimization
Publications (13)

Proceedings Article | 18 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Silicon, Inspection, Diagnostics, Feature extraction, Machine learning, High volume manufacturing, Failure analysis

Proceedings Article | 10 April 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Data modeling, Manufacturing, Feature extraction, Design for manufacturing, Machine learning, Testing and analysis, Model-based design

Proceedings Article | 4 April 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Optical lithography, Metals, Pattern recognition, Manufacturing, Design for manufacturing, Machine learning, Image classification, Library classification systems

Proceedings Article | 30 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Analytics, Logic, Optical lithography, Statistical analysis, Databases, Metals, Silicon, Manufacturing, Computer simulations, Design for manufacturing, Charge-coupled devices, Optical proximity correction, Digital electronics, Product engineering, Yield improvement, Model-based design, Process modeling, Design for manufacturability

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Image processing, Manufacturing, Image quality, Design for manufacturing, Optical proximity correction, Model-based design, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, 3D modeling, Monte Carlo methods, Photomasks, Directed self assembly, Computational lithography, Critical dimension metrology, Photoresist processing, Instrument modeling

Showing 5 of 13 publications
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