MunSik Kim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Quartz, Particles, Image restoration, Chromium, Scanning electron microscopy, Photomasks, Deposition processes, Critical dimension metrology, Phase shifts

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Defect detection, Silica, Quartz, Particles, Light scattering, Surface roughness, Distortion, Photomasks, Critical dimension metrology

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Defect detection, Image processing, Particles, Manufacturing, Inspection, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Defect inspection

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Silicon, Light scattering, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Wafer testing

Showing 5 of 18 publications
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