Dr. Munehiro Ogasawara
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | October 25, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Logic, Optical lithography, LCDs, Photomasks, Extreme ultraviolet, Electron beam melting, Line edge roughness

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lenses, Data storage, Printing, Photomasks, Beam shaping, Optical proximity correction, Electron beam melting, Line edge roughness, Data conversion, Vestigial sideband modulation

SPIE Journal Paper | March 23, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Critical dimension metrology, Beam shaping, Vestigial sideband modulation, Photomasks, Diffusion, Glasses, Line edge roughness, Error analysis, Thermal modeling, Temperature metrology

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Electron beam lithography, Roentgenium, Modulation, Quartz, Diffusion, Computer simulations, Photomasks, Critical dimension metrology, Thermal modeling, Temperature metrology

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Line edge roughness, EUV optics

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Scattering, Numerical modeling, Time metrology, Photomasks, Current controlled current source, Next generation lithography mask technology

Showing 5 of 23 publications
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