Munhoe Do
at Synopsys Korea Inc
SPIE Involvement:
Publications (13)

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 124951E (2023)
KEYWORDS: Machine learning, Lithography, Photomasks, Source mask optimization, Numerical analysis, Convolutional neural networks, Computational lithography

Proceedings Article | 4 April 2017 Presentation + Paper
Jinhyuck Jun, Jaehee Hwang, Jaeseung Choi, Seyoung Oh, Chanha Park, Hyunjo Yang, Thuc Dam, Munhoe Do, Dong Chan Lee, Guangming Xiao, Jung-Hoe Choi, Kevin Lucas
Proceedings Volume 10148, 1014809 (2017)
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 18 March 2015 Paper
Jinhyuck Jun, Minwoo Park, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Dongchan Lee, Taehoon Kim, Junghoe Choi, Gerard Luk-Pat, Alex Miloslavsky
Proceedings Volume 9427, 94270D (2015)
KEYWORDS: Atrial fibrillation, Semiconducting wafers, Photomasks, Critical dimension metrology, Optical proximity correction, Nanoimprint lithography, Lithography, Printing, SRAF, Manufacturing

Proceedings Article | 18 March 2015 Paper
Seongjin Kim, Munhoe Do, Yongbae An, Jaeseung Choi, Hyunjo Yang, Donggyu Yim
Proceedings Volume 9426, 94261X (2015)
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Photomasks, Model-based design, Resolution enhancement technologies, Semiconducting wafers, Logic devices, Current controlled current source, Logic

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530J (2014)
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Printing, Semiconducting wafers, 3D modeling, Calibration, Optimization (mathematics), Source mask optimization, Manufacturing

Showing 5 of 13 publications
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