Dr. Munirathna Padmanaban
Independant Consultant at Private
SPIE Involvement:
Author
Area of Expertise:
Polymer Science & Technology , Resist Chemistry and processing , Lithography , Photochemistry , Underlayers , Bottom anti-reflective coatings
Websites:
Profile Summary

Highly accomplished executive and scientist. Over 25 years of experience in project management, R&D to commercialization process, people management. Expert in the field of materials for electronic industry such as photo resist chemistry, bottom anti-reflective coatings and under layer materials. Internationally recongnized scientist with good Japanese language capability. More than 100 published papers, 20 issued patents and 50 published patent applications.
Publications (48)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Annealing, Directed self assembly, High volume manufacturing, Nanolithography, Thin film manufacturing, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | April 7, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Contamination, Etching, Metals, Silicon, Reflectivity, Photomasks, System on a chip, Plasma

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Silicon, Resistance, Oxygen, Semiconducting wafers

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Optical lithography, Polymers, Coating, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Oxides, Etching, Metals, Dielectrics, Silicon, Coating, Resistance, Photomasks, Plasma etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Etching, Polymers, Silicon, Coating, Resistance, Photomasks, Plasma etching, Semiconducting wafers, System on a chip

Showing 5 of 48 publications
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