Myoung-Ho Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Silicon, Coating, Resistance, Photoresist materials, Photomasks, Photoresist processing

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Scanners, Photography, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Semiconductors, Lithography, Etching, Capillaries, Scanners, Coating, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Liquids

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