Dr. Myoung-Soo Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Imaging systems, Inspection, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Defect inspection

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Diffraction, Refractive index, Femtosecond phenomena, Quartz, Distortion, Transmittance, Photomasks, Semiconducting wafers, Pulsed laser operation, Binary data

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Laser processing, Chromium, Control systems, Photomasks, Logic devices, Optical alignment, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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