Nacer Zine El Abidine
at STMICROELECTRONICS
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 27 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Wafer-level optics, Neck, Data modeling, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 28 July 2014 Paper
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Electron beam lithography, Data modeling, Calibration, Etching, Error analysis, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Semiconducting wafers

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