Dr. Nadav Gutman
Research Fellow at KLA Israel
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Scanners, Photomasks, Metrology, Finite element methods, Semiconducting wafers, Diffraction, Lithography, Phase shifts, Calibration, Scatterometry

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