Dr. Nadav Gutman
Research Fellow at KLA-Tencor Israel
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Metrology, Calibration, Scanners, Scatterometry, Finite element methods, Photomasks, Semiconducting wafers, Phase shifts

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top