Dr. Nadav Wertsman
at Carl Zeiss SMS Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Data modeling, Silica, Scanners, Data acquisition, Process control, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Metrology, Manufacturing, Scanning electron microscopy, Photomasks, Integrated circuits, Critical dimension metrology, Line edge roughness, Photomask technology, Edge roughness

Proceedings Article | 27 January 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Semiconductors, Metrology, Optical lithography, 3D modeling, Scanning electron microscopy, Monte Carlo methods, 3D metrology, Gallium, Tolerancing

Proceedings Article | 27 January 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Reticles, Metrology, Optical lithography, Scanning electron microscopy, Process control, Shape analysis, Optical proximity correction, Algorithm development, OLE for process control

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Metrology, Image segmentation, Image processing, Feature extraction, Scanning electron microscopy, Photomasks, Optical proximity correction, Algorithm development, OLE for process control

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Optical lithography, Inspection, Scanning electron microscopy, Process control, Shape analysis, Optical proximity correction, Algorithm development, Semiconducting wafers

Showing 5 of 6 publications
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