Dr. Nader Shamma
Engineering Director at Lam Research Corp
SPIE Involvement:
Publications (16)

Proceedings Article | 10 April 2024 Presentation + Paper
Jyun-Ming Chen, David Rio, Maxence Delorme, Cyrus Tabery, Christoph Hennerkes, Chris Spence, Benjamin Kam, Mohand Brouri, Nader Shamma
Proceedings Volume 12953, 129530C (2024) https://doi.org/10.1117/12.3010402
KEYWORDS: Photoresist materials, Optical proximity correction, Calibration, Semiconducting wafers, Shrinkage, Printing, Scanning electron microscopy, Photoresist developing, Metals, Critical dimension metrology

Proceedings Article | 10 April 2024 Presentation + Paper
Eren Canga, Victor Blanco, Anne-Laure Charley, Cyrus Tabery, Gabriel Zacca, Nader Shamma, Benjamin Kam, Mohand Brouri
Proceedings Volume 12955, 129551R (2024) https://doi.org/10.1117/12.3010115
KEYWORDS: Overlay metrology, Etching, Photoresist materials, Extreme ultraviolet lithography, Lithography, Diffraction gratings, Diffraction, Reproducibility, Photoresist developing, Metrology

Proceedings Article | 13 June 2022 Presentation
Mohammed Alvi, Richard Gottscho, Ali Haider, Seongjun Heo, PingYen Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, Da Li, Henry Nguyen, Yang Pan, Daniel Peter, Nader Shamma, Anuja De Silva, Samantha Tan, Ethen Wang, Timothy Weidman, Rich Wise, Morrey Wu, Elisseos Verveniotis, Boris Volosskiy, Jengyi Yu, Hicham Zaid
Proceedings Volume PC12055, PC120550B (2022) https://doi.org/10.1117/12.2623499
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Electron beam lithography, Semiconducting wafers, Photoresist processing, Etching, Inspection, Wafer inspection

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290U (2020) https://doi.org/10.1117/12.2569606

Proceedings Article | 16 October 2019 Presentation
Proceedings Volume 11147, 111470W (2019) https://doi.org/10.1117/12.2539272
KEYWORDS: Stochastic processes, Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Etching, Photoresist developing, Lithography, Interfaces, Absorbance

Showing 5 of 16 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top