Mr. Nader Shamma
Engg Director at Lam Research
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Silicon, Scanning electron microscopy, Image filtering, Line width roughness, Line edge roughness, Photoresist processing, Standards development

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Plasma etching, Critical dimension metrology

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Scanning electron microscopy, Photoresist materials, Photomasks, Double patterning technology, Photoresist developing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Etching, Manufacturing, Photomasks, Charge-coupled devices, Critical dimension metrology, Neodymium, Semiconducting wafers, Tolerancing

Showing 5 of 10 publications
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