Nader Shamma
Engg Director at Lam Research Corp
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 24 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Metrology, Optical lithography, Etching, Computer simulations, Time metrology, Bridges, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Focus stacking software

Proceedings Article | 20 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Silicon, Scanning electron microscopy, Image filtering, Line width roughness, Line edge roughness, Photoresist processing, Standards development

Showing 5 of 13 publications
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