Dr. Nadir S. Faradzhev
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Molecules, Manufacturing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Molecules, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Ruthenium, EUV optics

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Thin films, Ellipsometry, Contamination, Imaging systems, Dielectrics, Polarizers, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Contamination, Molecules, Electrons, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, EUV optics, Protactinium

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Carbon, Contamination, Titanium dioxide, Molecules, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Molecular interactions, Protactinium

PROCEEDINGS ARTICLE | March 20, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Mirrors, Molecules, Reflectivity, Reflectometry, Solids, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Oxidation

Showing 5 of 6 publications
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