Dr. Nadya Belova
Process Development and OPC Engineer at ON Semiconductor
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Author
Publications (7)

Proceedings Article | 18 July 2013
Proc. SPIE. 8700, International Conference Micro- and Nano-Electronics 2012
KEYWORDS: Oxides, Statistical analysis, Dielectrics, Reliability, Resistance, Computer programming, Cobalt, Head, Transistors, Resistors

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Statistical analysis, Error analysis, Manufacturing, Computer simulations, Monte Carlo methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Logic, Metals, Fourier transforms, Control systems, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Prototyping

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Logic, Data modeling, Image processing, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Tolerancing, Performance modeling

Proceedings Article | 3 May 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Reticles, Metrology, Logic, Statistical analysis, Error analysis, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 7 publications
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