Nageswara Rao Guntupalli
at Mentor Graphics (Sales and Services) Private Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Process modeling, Modulation, Photomasks, Data modeling, SRAF, Manufacturing, Cadmium, Laser scattering, Scattering, Data corrections

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Manufacturing, Data processing, Software development, Standards development, Visualization, Vestigial sideband modulation, Line edge roughness, Critical dimension metrology, Computing systems, Photomask technology

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photomasks, Vestigial sideband modulation, Software development, Algorithm development, Prototyping, Switches, Photomask technology, Current controlled current source, Electronic design automation, Numerical analysis

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Associative arrays, Detection and tracking algorithms, Data conversion, Detector arrays, Electronic design automation, Software development, Bismuth, Photomask technology, Current controlled current source, Optical proximity correction

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, Databases, Fluorescence correlation spectroscopy, Resolution enhancement technologies, Vestigial sideband modulation, Optical proximity correction, Neodymium, Distributed computing, Raster graphics, Data processing

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