Nakgeuon Seong
Director at ASML Technology Development Center
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 2 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Logic, Optical lithography, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 1 May 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Lithographic illumination, Cadmium, Photomasks, Extreme ultraviolet, Compact discs, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Diffraction gratings

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Polarization, Scanners, Control systems, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Light sources, Metrology, Optical lithography, Lithographic illumination, Process control, Critical dimension metrology, Laser metrology, Semiconducting wafers, Light

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Chromatic aberrations, Lithography, Metrology, Optical lithography, Laser drilling, Electroluminescence, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 27 publications
Conference Committee Involvement (2)
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVII
24 February 2004 | Santa Clara, California, United States
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