Nandasiri Samarakone
at ASML Special Applications
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Etching, Argon, Ions, Reflectivity, Scanning electron microscopy, Printing, Line width roughness, Ion implantation, Photoresist processing

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical components, Microfluidics, Transparency, Contamination, Water, Ultraviolet radiation, Immersion lithography, Semiconducting wafers, Pulsed laser operation, Absorption

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Error analysis, Scanning electron microscopy, Bridges, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Refractive index, Microfluidics, Contamination, Water, Glasses, Immersion lithography, Critical dimension metrology, Neodymium, Semiconducting wafers, Absorption

Proceedings Article | 14 June 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Etching, Image processing, Atomic force microscopy, Scanning electron microscopy, Image quality, Plasma etching, Critical dimension metrology, Line edge roughness, Edge roughness, Plasma

Proceedings Article | 29 June 1998
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Chemistry, Plasma etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Plasma

Showing 5 of 12 publications
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