Mr. Naoki Fukuda
at Advantest Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Optical lithography, Opacity, Sensors, Glasses, Scanning electron microscopy, Image quality, Photomasks, Selenium, Line scan image sensors

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Databases, Inspection, Scanning electron microscopy, Optical inspection, 3D metrology, Photomasks, Semiconducting wafers, 3D image processing, Defect inspection

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Sensors, Databases, Inspection, Scanning electron microscopy, Image quality, 3D metrology, Photomasks, Semiconducting wafers, Signal detection

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