Naoki Man
at Toray Research Ctr Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Etching, Polymers, Ions, Silicon, Diffusion, Photoresist materials, Ion beams, Profiling, Thin film coatings, Photoresist processing

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Carbon, Thin films, Etching, Hydrogen, Distortion, Oxygen, Photoresist materials, Profiling, Process control, Fluorine

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Polymers, Ions, Diffusion, Coating, Transmission electron microscopy, Photoresist materials, Line width roughness, Chemical analysis, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Scanners, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Water, Digital watermarking, Surface properties, Bridges, Chemical analysis, Immersion lithography, Semiconducting wafers, Standards development, Defect inspection

Showing 5 of 6 publications
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