Naoki Shibata
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical lithography, Particles, Coating, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 19 October 2018 Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography

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