Naoki Ueda
at Osaka Prefecture University Graduate school
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Numerical simulations, Collimation, Transmittance, Photomasks, Geometrical optics, Binary data, Light wave propagation, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Collimation, Transmittance, Photomasks, Geometrical optics, Binary data, Light wave propagation, Resolution enhancement technologies, Phase shifts

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