Mr. Naoki Yasui Profile

Naoki Yasui

at Hitachi High-Tech Corp

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Author

Publications (2)

Proceedings Article | 2 April 2010 Paper

Application of model-based library approach to photoresist pattern shape measurement in advanced lithography

Naoki Yasui, Miki Isawa, Toru Ishimoto, Kohei Sekiguchi, Maki Tanaka, Mayuka Osaki, Chie Shishido, Norio Hasegawa, Shaunee Cheng

Proceedings Volume 7638, 76382O (2010) https://doi.org/10.1117/12.846504

KEYWORDS: Photoresist materials, Lithography, Critical dimension metrology, Scanning electron microscopy, Lithographic illumination, Model-based design, Process control, Mathematical modeling, Immersion lithography, Semiconducting wafers

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Proceedings Article | 2 April 2010 Paper

Study on practical application to pattern top resist loss measurement by CD-SEM for high NA immersion lithography

Toru Ishimoto, Naoki Yasui, Norio Hasegawa, Maki Tanaka, Shaunee Cheng

Proceedings Volume 7638, 76382P (2010) https://doi.org/10.1117/12.846541

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Immersion lithography, Etching, Photoresist processing, Metrology, Lithography, Semiconducting wafers, Finite element methods, Semiconductors

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