Naoki Yasui
at Hitachi High-Tech Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Immersion lithography, Etching, Photoresist processing, Metrology, Lithography, Semiconducting wafers, Finite element methods, Semiconductors

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Photoresist materials, Lithography, Critical dimension metrology, Scanning electron microscopy, Lithographic illumination, Model-based design, Process control, Mathematical modeling, Immersion lithography, Semiconducting wafers

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