Naoko Kihara
at Toshiba Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 26 March 2013 Paper
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Carbon, Lithography, Magnetism, Scanning electron microscopy, Photomasks, Directed self assembly, Servomechanisms, Reactive ion etching, Beam propagation method, Nanolithography

Proceedings Article | 21 March 2012 Paper
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Electron beam lithography, Etching, Magnetism, Image analysis, Oxygen, Scanning electron microscopy, Directed self assembly, Servomechanisms, Reactive ion etching, Beam propagation method

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Etching, Ultraviolet radiation, Nickel, Silicon, Magnetism, Photomasks, Servomechanisms, Nanoimprint lithography, Electroplating, Beam propagation method

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Etching, Polymers, Magnetism, Interference (communication), Distortion, Scanning electron microscopy, Head, Servomechanisms, Photoemission spectroscopy, Beam propagation method

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Etching, Polymers, Image processing, Particles, Silicon, Atomic force microscopy, Dynamic light scattering, Photomasks, Picosecond phenomena, Semiconducting wafers

Showing 5 of 11 publications
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