Prof. Naoko Kuwahara
Research Engineer at Dai Nippon Printing Co Ltd
SPIE Involvement:
Publications (7)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 702838 (2008)
KEYWORDS: Photomasks, Data modeling, Optical simulations, Scanning electron microscopy, Semiconducting wafers, Mask making, Optical proximity correction, Lithography, Electronic design automation, Inspection

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66073I (2007)
KEYWORDS: Double patterning technology, Nanoimprint lithography, Photomasks, Neodymium, Optical alignment, Chromium, Nanolithography, Fabrication, Scanning electron microscopy, Quartz

Proceedings Article | 9 November 2005 Paper
Proceedings Volume 5992, 59924R (2005)
KEYWORDS: Photomasks, Data corrections, Distortion, Silicon, Electron beam lithography, Metrology, Mask making, Data modeling, Semiconducting wafers, Printing

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005)
KEYWORDS: Photomasks, Distortion, Charged-particle lithography, Electron beam direct write lithography, Silicon, Image analysis, Lithography, Metrology, Semiconducting wafers, Error analysis

Proceedings Article | 27 December 2002 Paper
Naoko Kuwahara, Takeshi Ohfuji, Naoya Hayashi, Curt Jackson, Naoki Kitano, David Hwang
Proceedings Volume 4889, (2002)
KEYWORDS: Monte Carlo methods, Cadmium sulfide, Convolution, Photomasks, Lithography, Chemical analysis, Diffusion, Interfaces, Computer simulations, Optical simulations

Showing 5 of 7 publications
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