Ms. Naoko Shirota
at Asahi Glass Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Sputter deposition, Polymers, Interfaces, Ions, Scanning electron microscopy, Polymerization, Immersion lithography, Photoresist processing, Polymer thin films

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Imaging systems, Polymers, Coating, Polymerization, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Polymers, Scanning electron microscopy, Polymerization, Immersion lithography, Thin film coatings, Fluorine, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Transparency, Etching, Dry etching, Polymers, Diffusion, Resistance, Immersion lithography, Fluorine, Absorption

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Oscillators, Quartz, Polymers, Water, Crystals, Silicon, Diffusion, Immersion lithography, Fluorine, Data analysis

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, FT-IR spectroscopy, Transparency, Polymers, Hydrogen, Manufacturing, Pellicles, Polymerization, Fluorine, 193nm lithography

Showing 5 of 6 publications
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