Naonori Kita
at Nikon Corp
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | December 2, 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Diffraction, Lithographic illumination, Ions, Control systems, Photomasks, Immersion lithography, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Modulation, Scanners, Distortion, 3D modeling, Software development, Photomasks, Optical proximity correction, Optimization (mathematics), Fiber optic illuminators

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Scanners, Electroluminescence, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Detection and tracking algorithms, Image processing, Photomasks, Cadmium sulfide, Source mask optimization, Optical proximity correction, Freeform optics, Optimization (mathematics), Semiconducting wafers, Optics manufacturing

Showing 5 of 18 publications
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