CONFERENCE PROCEEDINGS
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Naosuke Nishimura
at Canon Inc
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 22 March 2016 Paper
Nanoimprint system development and status for high-volume semiconductor manufacturing
Tsuneo Takashima, Yukio Takabayashi, Naosuke Nishimura, Keiji Emoto, Takahiro Matsumoto, Tatsuya Hayashi, Atsushi Kimura, Jin Choi, Philip Schumaker
Proceedings Volume 9777, 977706 (2016) https://doi.org/10.1117/12.2219001
KEYWORDS: Photomasks, Nanoimprint lithography, Lithography, Overlay metrology, Semiconductor manufacturing, Semiconductors, Semiconducting wafers, Particles, Capillaries, Ultraviolet radiation, Distortion, High volume manufacturing, Actuators
Proceedings Article | 27 March 2008 Paper
Study of system performance in SFET
Naosuke Nishimura, Gaku Takahashi, Toshihiko Tsuji, Hideki Morishima, Kazuhiko Kajiyama, Shigeyuki Uzawa
Proceedings Volume 6921, 69211C (2008) https://doi.org/10.1117/12.771952
KEYWORDS: Fiber optic illuminators, Semiconducting wafers, Light sources, Photomasks, Metals, Extreme ultraviolet lithography, Nanoimprint lithography, Sensors, Error analysis, Extreme ultraviolet
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