Naoya Hayashi
Research Fellow at Dainihon'Insatsu (Kabu) Mikuroseihinjigyobu;Dainippon Printing Co Ltd
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Symposium Chair | Conference Co-Chair | Author | Editor
Publications (171)

Proceedings Article | 19 April 2019
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanostructures, Diffraction, Scattering, Quartz, X-rays, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Nanoimprint lithography, X-ray detectors

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Process control, Photomasks, Nanoimprint lithography

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, Tantalum

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Lithography, Photomasks, Nanoimprint lithography

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology