Naoya Hayashi
Research Fellow at Dai Nippon Printing Co Ltd
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Symposium Chair | Conference Co-Chair | Author | Editor
Publications (170)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Process control, Photomasks, Nanoimprint lithography

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, Tantalum

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Lithography, Photomasks, Nanoimprint lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

Showing 5 of 170 publications
Conference Committee Involvement (42)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Showing 5 of 42 published special sections
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