Naoya Hayashi
Research Fellow at Dai Nippon Printing Co Ltd
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (169)

Proceedings Article | 22 September 2020 Poster + Presentation
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Semiconductors, Lithography, Optical lithography, Scattering, Quartz, X-rays, Photomasks, Nanoimprint lithography, Semiconducting wafers, Scatter measurement

Proceedings Article | 19 April 2019 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Nanostructures, Diffraction, Scattering, Quartz, X-rays, Scanning electron microscopy, Transmission electron microscopy, Time metrology, Nanoimprint lithography, X-ray detectors

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Process control, Photomasks, Nanoimprint lithography

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, Tantalum

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Lithography, Photomasks, Nanoimprint lithography

Showing 5 of 169 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 24 November 2015

SPIE Conference Volume | 29 October 2014