CONFERENCE PROCEEDINGS
Advanced Search
Naoyoshi Hatakeyama
Senior Coordinator at Idemitsu Chemicals USA
SPIE Involvement:
Author
Websites:
Company Website
Publications (2)
Proceedings Article | 4 April 2008 Paper
Adamantane-based molecular glass resist for 193-nm lithography and beyond
Shinji Tanaka, Nobuaki Matsumoto, Hidetoshi Ohno, Naoyoshi Hatakeyama, Katsuki Ito, Kazuya Fukushima, Hiroaki Oizumi, Iwao Nishiyama
Proceedings Volume 6923, 69231J (2008) https://doi.org/10.1117/12.772249
KEYWORDS: Glasses, Lithography, Refractive index, Polymers, Transparency, Extreme ultraviolet lithography, Radium, Optical lithography, Immersion lithography, Sulfur
Proceedings Article | 27 March 2008 Paper
Leading-edge adamantyl polymers designed for 193 nm lithography
Kazuya Fukushima, Shinji Tanaka, Nobuaki Matsumoto, Hidetoshi Ohno, Naoya Kawano, Hideki Yamane, Naoyoshi Hatakeyama, Katsuki Ito
Proceedings Volume 6923, 692335 (2008) https://doi.org/10.1117/12.772251
KEYWORDS: Polymers, Refractive index, Magnesium, Chemical species, Transparency, Radium, Lithography, Line edge roughness, Sulfur, Atomic force microscopy
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top