CONFERENCE PROCEEDINGS
Advanced Search
Narahari S. Pujari
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 26 March 2008 Paper
High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography
Proceedings Volume 6923, 69231P (2008) https://doi.org/10.1117/12.770458
KEYWORDS: Polymers, Nanoparticles, Refractive index, Nanocomposites, Immersion lithography, Particles, Zinc, Lead, Metals, Lithography
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top