Dr. Narender Rana
at Western Digital Corp.
SPIE Involvement:
Conference Program Committee | Author
Publications (18)

PROCEEDINGS ARTICLE | May 21, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Principal component analysis, Data modeling, Manufacturing, Magnetism, Process control, Neural networks, Semiconducting wafers, Data integration, Instrument modeling

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Manufacturing, Inspection, Scanning electron microscopy, Image quality, Image filtering, Neural networks, Machine learning, Image classification, Critical dimension metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Manufacturing, Scanning electron microscopy, Transmission electron microscopy, Image processing software, 3D metrology, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Data modeling, Scanners, 3D modeling, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Critical dimension metrology, Process modeling

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Data modeling, Resistance, Capacitance, Neural networks, Extreme ultraviolet, Machine learning, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

SPIE Journal Paper | December 29, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Data modeling, Metrology, Critical dimension metrology, Scatterometry, Atomic force microscopy, Process modeling, Machine learning, Analytics, Optical lithography, Calibration

Showing 5 of 18 publications
Conference Committee Involvement (3)
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
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