Dr. Natalia V. Davydova
Sr. Architect at ASML Netherlands BV
SPIE Involvement:
Area of Expertise:
Publications (39)

Proceedings Article | 10 April 2024 Poster
Mahmudul Hasan, Willem van Mierlo, Jeff Hsia, Natalia Davydova, Andreas Frommhold, Christophe Beral, Anne-Laure Charley, Matteo Beggiato
Proceedings Volume 12955, 129552S (2024) https://doi.org/10.1117/12.3010445
KEYWORDS: Metrology, Scanning electron microscopy, Photoresist materials, Defect inspection, Image quality, Electron beam lithography, Defect detection, Yield improvement, Signal to noise ratio, Semiconducting wafers

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530M (2024) https://doi.org/10.1117/12.3012722
KEYWORDS: Optical lithography, Reticles, Extreme ultraviolet, Process control, Critical dimension metrology, Computational lithography, Design and modelling, Optical proximity correction, Imaging systems, Tantalum

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530J (2024) https://doi.org/10.1117/12.3010895
KEYWORDS: Critical dimension metrology, Reflectivity, Optical proximity correction, Light sources and illumination, Extreme ultraviolet, Design, Simulations, Scanners, Image processing, Modulation

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275002 (2023) https://doi.org/10.1117/12.2687703
KEYWORDS: Critical dimension metrology, Zoom lenses, Reticles, Metrology, Image quality, Extreme ultraviolet, Stochastic processes, Statistical analysis, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940Q (2023) https://doi.org/10.1117/12.2658511
KEYWORDS: Photomasks, Optical proximity correction, Reflection, Critical dimension metrology, Tantalum, Reflectivity, Metrology, Semiconducting wafers, Scanners, Reticles

Showing 5 of 39 publications
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