Dr. Natalia V. Davydova
Senior Design Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Reflection, Scanners, Coating, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Apodization, Refractive index, Distortion, 3D modeling, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Tantalum, Absorption

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Ions, 3D modeling, 3D metrology, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Diffraction, Mirrors, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

Showing 5 of 25 publications
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