Dr. Natalia V. Davydova
Senior Design Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Reticles, Deep ultraviolet, Imaging systems, Scanners, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Apodization, Refractive index, Distortion, 3D modeling, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Tantalum, Absorption

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Metrology, Scanners, Ions, 3D modeling, 3D metrology, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Diffraction, Mirrors, Inspection, Printing, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Prototyping, 3D image processing

Showing 5 of 26 publications
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