Mr. Nathan E. Wilcox
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, EUV optics, Laser phosphor displays

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Manufacturing, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Laser phosphor displays

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beams, Backscatter, Etching, Manufacturing, Inspection, Image quality, Photomasks, SRAF, Line edge roughness, Laser phosphor displays

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Thin films, Reticles, Metrology, Distortion, Image registration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film deposition, Personal protective equipment

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

Showing 5 of 10 publications
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