Nathan E. Wilcox
Sr Staff Engineer at Intel Corp
SPIE Involvement:
Publications (11)

Proceedings Article | 2 January 2019 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Contamination, Imaging systems, Scanners, Particles, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, EUV optics, Laser phosphor displays

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Etching, Manufacturing, Photomasks, Line edge roughness, Photoresist processing, Semiconducting wafers, Laser phosphor displays

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Electron beams, Backscatter, Etching, Manufacturing, Inspection, Image quality, Photomasks, SRAF, Line edge roughness, Laser phosphor displays

Showing 5 of 11 publications
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