Prof. Naum Frage Profile

Prof. Naum Frage

at Ben-Gurion Univ

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Proceedings Article | 22 January 2005 Paper

Sealing technique for wafer-level integrated cavity using In-Ag multilayers

Lilach Karpenkopf, Naum Frage, Alexander Ripp, Natalya Froumin, Moshe Dariel

Proceedings Volume 5716, (2005) https://doi.org/10.1117/12.590184

KEYWORDS: Silver, Diffusion, Indium, Silicon, Heat treatments, Scanning electron microscopy, Metals, Solids, Copper, Microopto electromechanical systems

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The performance of MOEMS (Micro-Optical-Electronic-Micro-Systems) may be significantly improved and their service life-time extended by packaging under vacuum. For numerous applications the bonding process temperature has to be below 200°C and sealed joints must withstand a reflow temperature (about 250 - 280°C) without debonding and unsealing. The Ag-In system has been selected for developing such a bonding process. In this study, the kinetics and sequence of intermetallic phase growth in a Ti/Ag/In/Ag multilayer structure with various ratios of thicknesses, deposited on a silicon substrate, was investigated by DSC (Differential Scanning Callorimetry), SEM and XRD analysis. The joints were examined by DSC to determine the re-melting temperatures and the quality of a cavity sealing was evaluated using a helium leak detection system. It was established that annealing a Ag/In multilayer with a total AG to In layer thickness ratio equal to 3 and an overall thickness of about 10 μm under vacuum of 10^-7 torr at 190°C for 40 min allows achieving a void-free joint consisting of two intermetallic phases Ag₂In (γ) and AgIn₂ (φ). A further appropriate thermal treatment at a relatively low temperature in air leads to the formation of the joint with a re-melting temperature higher than 300°C. The helium leak rate of the integrated cavity was experimentally estimated in the 5 - 10 x 10^-9 mbar 1 s^-1 range.

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