Nazeen Jeewakhan
Process Development Engineer at Western Digital Corp
SPIE Involvement:
Publications (3)

Proceedings Article | 20 October 2006 Paper
Nazneen Jeewakhan, Nader Shamma, Sang-Jun Choi, Roque Alvarez, D. Son, Makoto Nakamura, Vinny Pici, Jim Schreiber, Wei-shun Tzeng, Sean Ang, Daniel Park
Proceedings Volume 6349, 63490G (2006)
KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Charge-coupled devices, Lithography, Tolerancing, Reticles, Manufacturing, Neodymium, Photomasks

Proceedings Article | 17 December 2003 Paper
Dongsung Hong, Prakash Krishnan, Dianna Coburn, Nazneen Jeewakhan, Shengqi Xie, Joshua Broussard, Bradley Ferguson, Kent Green, Peter Buck, Curt Jackson, Larry Martinez
Proceedings Volume 5256, (2003)
KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Metals, Vestigial sideband modulation, Reticles, Optical proximity correction, Back end of line, Critical dimension metrology, Cadmium

Proceedings Article | 2 June 2003 Paper
Chris Jones, Chidam Kallingal, Mary Zawadzki, Nazneen Jeewakhan, Nazila Kaviani, Prakash Krishnan, Arthur Klaum, Joel Van Ess
Proceedings Volume 5038, (2003)
KEYWORDS: Photoresist materials, Semiconducting wafers, Optical lithography, Inspection, Etching, Critical dimension metrology, Scanning electron microscopy, Wafer testing, Semiconductors, Photoresist processing

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