Prof. Ndaona Chokani
Senior Scientist at ETH Zurich
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Sputter deposition, Particles, Ions, Monte Carlo methods, Extreme ultraviolet, Optical simulations, Molybdenum, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Cooling systems, Mirrors, Mica, Particles, Plasmas, Manufacturing, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Atomic, molecular, and optical physics, Particles, Ions, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Near field optics, Tin

PROCEEDINGS ARTICLE | March 27, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Atomic, molecular, and optical physics, Ions, Plasmas, Nd:YAG lasers, Solids, Extreme ultraviolet, Optical simulations, Spherical lenses, Pulsed laser operation, Liquids

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