Dr. Neal V. Lafferty
at Siemens Digital Industries Software
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
lithography , optical proximity correction , source mask optimization
Publications (40)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 2 January 2019 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Image processing, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Manufacturing, Bridges, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Overlay metrology

Showing 5 of 40 publications
Conference Committee Involvement (6)
Design-Technology Co-optimization XV
21 February 2021 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIV
26 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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