Dr. Neal V. Lafferty
Product Manager, SMO at Mentor a Siemens Business
SPIE Involvement:
Conference Program Committee | Author
Publications (39)

Proceedings Article | 2 January 2019
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Logic, Image processing, Photomasks, Extreme ultraviolet, Image enhancement, Source mask optimization, SRAF, Tantalum, Resolution enhancement technologies

Proceedings Article | 20 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Image processing, Manufacturing, Printing, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction

Proceedings Article | 20 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Metals, Image processing, Manufacturing, Printing, Image quality, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Manufacturing, Bridges, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Overlay metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Cadmium, Visualization, Databases, Design for manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Superposition, Lithography, Data modeling, Image processing, 3D modeling, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Algorithm development, Optimization (mathematics), Performance modeling

Showing 5 of 39 publications
Conference Committee Involvement (4)
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability X
24 February 2016 | San Jose, California, United States
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