Neil Berns
at KLA Israel
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Reticles, Metrology, Calibration, Scanners, Scanning electron microscopy, Photomasks, Acquisition tracking and pointing, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Scanners, Control systems, Time metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Yield improvement, Airborne remote sensing

Proceedings Article | 15 May 2001
Proc. SPIE. 4284, Functional Integration of Opto-Electro-Mechanical Devices and Systems
KEYWORDS: Wafer-level optics, Switches, Switching, Waveguides, Signal attenuation, Silicon, Integrated optics, Integrated circuits, Photonic integrated circuits, Analog electronics

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