Dr. Nelson M. Felix
Manager - Foundational Patterning at IBM Corp
SPIE Involvement:
Conference Co-Chair | Conference Program Committee | Author | Editor
Publications (64)

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

SPIE Conference Volume | May 22, 2018

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Metals, Image processing, Dielectrics, Silicon, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

Showing 5 of 64 publications
Conference Committee Involvement (3)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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