Dr. Nelson M. Felix
Manager - Foundational Patterning at IBM Corp
SPIE Involvement:
Conference Co-Chair | Conference Program Committee | Author | Editor
Publications (68)

SPIE Journal Paper | January 8, 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Optical lithography, Extreme ultraviolet, High volume manufacturing, Extreme ultraviolet lithography, Lithography, Photomasks, Roads, Photoresist technology, Plasma etching, Image processing

PROCEEDINGS ARTICLE | October 19, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Coating, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Semiconductors, Oxides, Electron beam lithography, Optical lithography, Etching, Polymers, Interfaces, Semiconductor materials, Silicon, Head-mounted displays

SPIE Journal Paper | September 5, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Showing 5 of 68 publications
Conference Committee Involvement (2)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
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