Dr. Niamh Waldron
at IMEC
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Germanium, Gallium nitride, Gallium arsenide, CMOS technology, Field effect transistors, Fin field effect transistors, Group III-V semiconductors

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