Nicholas K. Eib
Technical Staff at Terapede Systems Inc
SPIE Involvement:
Author
Publications (14)

SPIE Journal Paper | 23 August 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Electrons, Extreme ultraviolet, Monte Carlo methods, Photons, Extreme ultraviolet lithography, Molybdenum, Absorption, Scattering, Lithography, Computer simulations

Proceedings Article | 24 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Diffraction, Mirrors, Calibration, Spatial light modulators, Photomasks, Transistors, Optical proximity correction, Maskless lithography, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Mirrors, Reticles, Scanners, Optical proximity correction, Maskless lithography, Analog electronics, Spiral phase plates, Binary data, Phase shifts

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffraction, Mirrors, Imaging systems, Light scattering, Spatial light modulators, Near field, Photomasks, Maskless lithography, Electromagnetism, Electromagnetic scattering

Proceedings Article | 12 July 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Reticles, Logic, Etching, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

Proceedings Article | 23 June 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Cadmium, Deep ultraviolet, Etching, Silicon, Inspection, Reflectivity, Thin film coatings, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

Showing 5 of 14 publications
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