Dr. Nicholas V. LiCausi
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Optical lithography, Resistance, Monte Carlo methods, Capacitance, Line width roughness, Double patterning technology, Line edge roughness

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Mirrors, Defect detection, Inspection, Reflectivity, Scanning electron microscopy, Optical inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | September 4, 2008
Proc. SPIE. 7079, Hard X-Ray, Gamma-Ray, and Neutron Detector Physics X
KEYWORDS: Sensors, Etching, Particles, Ions, Silicon, Monte Carlo methods, Capacitance, Boron, Deep reactive ion etching, Semiconducting wafers

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