Dr. Nick Cobb
Deceased at Mentor, a Siemens Business
SPIE Involvement:
Senior status | Author
Publications (42)

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Diffraction, Logic, Detection and tracking algorithms, Visualization, Photomasks, Optical proximity correction, Critical dimension metrology, Feedback control, Semiconducting wafers

Proceedings Article | 16 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Point spread functions, Optical lithography, Printing, Photomasks, Optical proximity correction, SRAF, Convolution, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Curium, Visualization, Diffusion, Scanning electron microscopy, Optical proximity correction, Convolution, Photoresist processing, Process modeling, Instrument modeling

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Defect detection, Silicon, Manufacturing, Printing, Photomasks, Optical proximity correction, Virtual reality, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 42 publications
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